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UPM-IB Solar Cell lab

  • Advanced characterisation of photovoltaic materials and solar cell devices
  • Intermediate Band Materials and Solar Cells Characterisation Laboratory
  • Device processing.

Technical Info

In a conventional solar cell, the value of the forbidden band determines both current and voltage. High values produce low currents (just a few photons are absorbed) and high voltages, and vice versa. There is an optimum which is theoretically oriented towards the silicon forbidden band (for isotropic solar illumination) . A. Luque y A. Martí (UPM) proposed in 1997 the convenience of placing an intermediate band (IB) allowed in the middle of the semiconductor forbidden band. According to a procedure patented by this team, the solar cell is formed up by placing the intermediate band material between two ordinary semiconductors: one of them n-type for contacting the conduction band (CB) and the other, p-type, for contacting the valence band (VB). The intermediate band is therefore isolated from the metallic contacts.

A set of advanced characterization tools has been grouped in a Laboratory called IBLAB (Intermediate Band LABoratory) and includes, for example, quantum efficiency measurements capable of detecting the two-photon below bandgap absorption, photoluminescence, electroluminescence, photoreflectance, current-voltage characteristics under concentrated light and cryogenic temperatures, AFM, FTIR, DLTS, etc

MAIN FEATURES :

  • Determination of semiconductor gap by photoreflectance*
  • Characterization of the quantum efficiency of novel solar cells*
  • Capability to obtain the current-voltage characteristics of solarcells in dark and in illumination conditions, up to concentrations of 2500x and at low temperatures*
  • Study of the behavior of novel semiconductors and devices under concentration up to 10.000x. This test can be performed at low temperatures (*)
  • Performance of FTIR tests in order to determine the optical absorption coefficient of photovoltaic materials mainly in the infrared*
  • Undertaking of DLTS measurements to study  semiconductor defects*
  • Measurement of photoluminescence and electroluminescence of materials and solar cells*
  • Capability to determine roughness of the semiconductor surface*
  • 3D Fabrication

(*) Under ISO9001 STANDARD

EQUIPMENT

Photoreflectance
  • Specifications according to ISO9001 (I-18-05)
  • Type of materials: Semiconductors
  • Metallization: NO
  • Thickness: <10mm
  • Size <0.5cmx0.5cm
  • Range of measurement: 400nm-2500nm
2. Quantum efficiency
  • Specifications according to ISO9001 (I-18-05)
  • Type of materials : 2 terminal Semiconductor Devices
  • Metallization: YES (grid)
  • Thickness: <5mm
  • Size <4cmx4cm
  • Range of measurement: 400nm-1700nm
  • Low Temperature Measurement Optional (see below)
3. Current-Voltage Characteristics
  • Specifications according to ISO9001 I-18-05
  • Type of materials : 2 terminal Semiconductor Devices
  • Metallization: YES
  • Thickness: <5mm
  • Size <1cmx1cm
  • Range of measurement: 100nA-1A
  • Low Temperature Measurement Optional (see below)
4. Concentration Measurements
  • Specifications according to ISO9001 I-18-05
  • Type of materials : 2 terminal Semiconductor Devices
  • Metallization: YES
  • Thickness: <5mm
  • Size <1cmx1cm
  • Range of measurement: 1uA-6A & 10ºC-50ºC
  • Low Temperature Measurement Optional (see below)
5. FTIR
  • Specifications according to ISO9001 I-18-05
  • Type of materials: semiconductors
  • Metallization: NO
  • Thickness: <5mm
  • Size >1cmx1cm
  • Range of measurement: 800nm-20000nm
6. Deep level Transient Spectroscopy (DLTS)
  • Specifications according to ISO9001 I-18-05
  • Type of materials: 2 terminal Semiconductor Devices
  • Metallization: YES
  • Thickness: <5mm
  • Size
  • Range of measurement: 77K-330K
7. Photoluminiscence
  • Specifications according to ISO9001 I-18-05
  • Type of materials: semiconductors
  • Metallization: NO
  • Thickness: <5mm
  • Size >0.5cmx0.5cm
  • Range of measurement: 300nm-2000nm
8. Electroluminiscence
  • Specifications according to ISO9001 I-18-05
  • Type of materials: 2 terminal semiconductor Devices
  • Metallization: YES
  • Thickness: <5mm
  • Size < 0.5cmx0.5cm
  • Range of measurement: 300nm-2000nm
9. Profiler
  • Specifications according to ISO9001 I-18-05
  • Type of materials: non viscous materials
  • Metallization:--
  • Thickness: <30mm
  • Size

LIMITATIONS OR CONSTRAINTS :

The UPM  IB SC group offer opportunities to access to their facility by  filling-in the specific form.  Information about  applied  RATES can be found here


TYPICAL SERVICES OR RESULTS

  • Characterization of semiconductors and devices for both research centers and companies
  • Assessment on the characterization results
  • Evaluation of intermediate band effects in different semiconductors: two-photon below bandgap absorption and voltage preservation under concentrated light.
  • 3D printing service

LIST OF SERVICES AGAINST PAYMENT

Services are done with the following reference prices:

Participation to Research Projects

  1. FULLSPECTRUM 6th Framework Program, SES-CT-2003-502620.
  2. IBPOWER 7th Framewok Program, 211640
  3. NGCPV 7th Framework Program, 283798
  4. NUMANCIA, Comunidad de Madrid, S-05050/ENE/0310
  5. GENESIS-FV, Proyect CONSOLIDER Spanish Education Ministry , CSD2006-0004
  6. Hot Carrier Solar Cells, GCEP-Stanford 19994610-40130
  7. NANOGEFES, Spanish Innovation and Science Ministry, ENE2009-14481-C02-01
  8. NUMANCIA-2,  Comunidad de Madrid 2010-2013, S2009/ENE-1477

 

Contacts

Address

ETSI Telecomunicación | Avda. Complutense, 30. 28040 Madrid, Spain

Main contact

MARTÍ Antonio